CVE Sputtering System
CVE system is a typical RF sputtering single-chamber system. It consists of two magnetrons, one heater and one turbo pump.
The temperature ranges from room temperature to 200 degrees Celsius.
Argon, oxygen and hydrogen are used according to different films. The system houses six 3" substrate holders and is suitable for multiple-wafer output.
See the costs to use the CVE sputtering system.