The reel to reel cluster tool by MVSystems Inc. is a 3-chamber system including plasma enhanced chemical vapor deposition (PECVD) chamber, dual sputter cathode chamber and a load lock chamber. It allows deposition using a cassette which houses the flexible material (stainless steel or plastic foil) with a web width of 15 cm, or a rigid substrate (Si or glass wafers) of dimension 15cmx15cm.

Process gases are set up in the following configuration:

• PECVD: SiH₄, TMB, PH₃, CH₄, NH₃, H₂, He, N₂O, and CF₄/O₂
• Sputtering:Ar and O₂
• Magnetron Sputter cathodes and target: ZnO and ITO targets

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